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中文摘要：
采用CS-400型射频磁控溅射仪在Si（111）和石英基底上成功的制备了Zn1-xCuxO薄膜，薄膜的晶体取向和表面形貌用X射线衍射（XRD）仪和扫描电子显微镜（SEM）进行测量。利用紫外-可见光（UV-vis）分光光度计来测量基片为石英的Zn1-xCuxO薄膜的透射光谱。实验表明，采用射频磁控溅射制备的掺Cu氧化锌薄膜具有（002）峰的择优取向。随着Cu掺入量的增加样品成膜质量降低，禁带宽度减小，透射率下降。
英文摘要：
Zn1-xCuxO films were prepared by the radio frequency magnetron sputtering technique（RF）on Si（111） and quartz glass substrates.The effect of Cu-doping on the structural and optical properties of ZnO films were discussed in details.X-ray diffraction（XRD） pattern indicates that the films are single phase and had wurtzite structure with c-axis orientation.The SEM shows that with the increasing of Cu content the grain size of ZnO films decreases and quality of ZnO films declines.In the transmittance spectra of the Zn1-xCuxO films the width of optical energy band gap and the transmittance are decreased with the increase of Cu content.
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