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频率组合对容性耦合等离子体SiO2刻蚀的影响
  • 期刊名称:苏州大学学报
  • 时间:0
  • 页码:53-56
  • 语言:中文
  • 分类:TN929.53[电子电信—通信与信息系统;电子电信—信息与通信工程] TG174.444[金属学及工艺—金属表面处理;金属学及工艺—金属学]
  • 作者机构:[1]School of Physical Science and Technology, Soochow University, Suzhou 215006, China, [2]School of Physics and Optoelectronic Technology, Dalian University of Technology,Dalian 116024, China
  • 相关基金:supported by National Natural Science Foundation of China (Nos. 10635010, 10775103)
  • 相关项目:甚高频阵列式容性耦合等离子体源的放电特性及均匀性研究
作者: 杨玲|辛煜|
中文摘要:

Nitrogen dual-frequency capacitively coupled plasmas(DF-CCPs) with different frequency configurations,i.e.,60/2 MHz and 60/13.56 MHz,are investigated by means of optical emission spectroscopy(OES) and a floating double probe.The excited nitrogen molecule ion N + 2(B) is monitored by measuring the emission intensity of the(0,0) bandhead of the first negative system(FNS) at 391.44 nm.It is shown that in the discharge with 60/13.56 MHz,the N + 2 emission intensity decreases with the increase in pressure.In the discharge with 60/2 MHz,however,an abnormal enhancement of N + 2 emission at higher pressure is observed when a higher power of 2 MHz is added.Variation in the ion density shows a similar dependence on the gas pressure.This indicates that in the discharge with 60/2 MHz there is a mode transition from the alpha to gamma type when a higher power of 2 MHz is added at high pressures.Combining the measurements using OES and double probe,the influence of low frequency on the discharge is investigated and the excitation route of the N + 2(B) state in the discharge of 60/2 MHz is also discussed.

英文摘要:

Nitrogen dual-frequency capacitively coupled plasmas (DF-CCPs) with different fre- quency configurations, i.e., 60/2 MHz and 60/13.56 MHz, are investigated by means of opticM emission spectroscopy (OES) and a floating double probe. The excited nitrogen molecule ion N+(B) is monitored by measuring the emission intensity of the (0,0) bandhead of the first neg- ative system (FNS) at 391.44 nm. It is shown that in the discharge with 60/13.56 MHz, the N+ emission intensity decreases with the increase in pressure. In the discharge with 60/2 MHz, however, an abnormal enhancement of N+ emission at higher pressure is observed when a higher power of 2 MHz is added. Variation in the ion density shows a similar dependence on the gas pressure. This indicates that in the discharge with 60/2 MHz there is a mode transition from the alpha to gamma type when a higher power of 2 MHz is added at high pressures. Combining the measurements using OES and double probe, the influence of low frequency on the discharge is investigated and the excitation route of the N+(B) state in the discharge of 60/2 MHz is also discussed.

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