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Triple-gate fin field effect transistors with fin-thickness optimization to reduce the impact of fin
  • 期刊名称：Japanese Journal of Applied Physics
  • 时间：0
  • 页码：04C052-04C052-3
  • 语言：英文
  • 相关项目：纳米工艺下可制造性和成品率驱动的集成电路设计方法学研究
作者： Shimeng Yu|Jinfeng Kang|Xiaoyan Liu|Yuning Zhao|Gang Du|Ruqi Han|
同期刊论文项目
纳米工艺下可制造性和成品率驱动的集成电路设计方法学研究
期刊论文 14 会议论文 37 专利 10
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