中文摘要：

根据电化学分析，5-甲基苯并三氮唑（m-BTA）的腐蚀抑制能力要高于并三唑（BTA）的-当羟基乙叉二膦酸（HEDP）电解液中同时含有m—BTA及氯离子时，其抑制解离能力比从含有m-BTA的更好，即使施加更岛的阳极氧化电位依然能保持良好的抑制能力。由电化学附抗谱法、纳米划痕实验以及能谱分析结果得知，m-BTA抑制能力的提升是因为整体钝化膜厚度的增加而引起的。由X射线光电子能谱分析得知，氯高子与m-BTA钝化层形成『Cu（1）Cl（m-BTA）]。高分子化合物，使得整体钝化层厚度增加。因此，在含有m—BTA的HEDP电解液中添加氯离了有助于m-BTA钝化层抑制能力的增强，进而更有效的电位操作区间得到扩展。

英文摘要：

According to the electrochemical analysis, the corrosion inhibition efficiency of 5-methyl-lH-benzotriazole （m-BTA） is higher than that of benzotrizaole （BTA）. The inhibition capability of the m-BTA passive film formed in hydroxyethylidenediphosphonic acid （HEDP） electrolyte containing both m-BTA and chloride ions is superior to that formed in m-BTA-alone electrolyte, even at a high anodic potential. The results of electrical impedance spectroscopy, nano-scratch experiments and energy dispersive analysis of X-ray （EDAX） indicate that the enhancement of m-BTA inhibition capability may be due to the increasing thickness of passive film. Furthermore, X-ray photoelectron spectrometry （XPS） analysis indicates that the increase in passive film thickness can be attributed to the incorporation of C1 into the m-BTA passive film and the formation of [Cu（I）CI（rn-BTA）], polymer film on Cu surface. Therefore, the introduction of C1- into m-BTA-containing HEDP electrolyte is effective to enhance the passivation capability of m-BTA passive film, thus extending the operating potential window.