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Tuning magnetic anistropy by charge injection and strain in Fe/MoS2 bilayer heterostructures
  • 期刊名称：Journal of Physics D: Applied Physics
  • 时间：2015
  • 页码：485001-
  • 相关项目：Gd,Si/Ge掺杂GaN 材料的自旋极化和磁相互作用量子机理研究
作者： Huibing Mao|Qing Zhao|Jingqing Wang|Huaizhong Xing|
同期刊论文项目
Gd,Si/Ge掺杂GaN 材料的自旋极化和磁相互作用量子机理研究
期刊论文 27
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