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Effect of Electromigration on Intermetallic Compound Formation in Cu/Sn/Cu Interconnect
所属机构名称:大连理工大学
会议名称:2009 International Conference on Electronic Packaging Technology & High Density Packaging(2009 电
成果类型:会议
会场:北京
相关项目:无铅化电子封装钎焊界面反应及焊点可靠性的基础研究
作者:
L. D. Chen|Mingliang Huang|
同会议论文项目
无铅化电子封装钎焊界面反应及焊点可靠性的基础研究
期刊论文 44
会议论文 31
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