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Investigation of silicon NC memory with improved threshold voltage window
  • 所属机构名称：北京大学
  • 会议名称：Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
  • 成果类型：会议
  • 会场：Shanghai
  • 相关项目：集成电路工艺研究（包括ＣＡＭ）
作者： Dake Wu|Zhe Yu|Ru Huang|Yongbian Kuang|Yan Li|Ruyan Tang|
同会议论文项目
集成电路工艺研究（包括ＣＡＭ）
期刊论文 55 会议论文 53 获奖 2 专利 35
同项目会议论文
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