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Investigation on the effective immunity to process induced line-edge roughness in silicon nanowire M
  • 所属机构名称：北京大学
  • 会议名称：2010 International Symposium on VLSI Technology, System and Application, VLSI-TSA 2010
  • 成果类型：会议
  • 会场：Hsin Chu, Taiwan
  • 相关项目：集成电路工艺研究（包括ＣＡＭ）
作者： Ding, Wei|Zhuge, Jing|Wang, Runsheng|Ru, Huang|Zhang, Liangliang|Yu, Tao|
同会议论文项目
集成电路工艺研究（包括ＣＡＭ）
期刊论文 55 会议论文 53 获奖 2 专利 35
同项目会议论文
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