First-principles calculation on the concentration of intrinsic defects in 4H-SiC
- ISSN号:1674-4926
- 期刊名称:《半导体学报:英文版》
- 时间:0
- 分类:TN386[电子电信—物理电子学] TM912[电气工程—电力电子与电力传动]
- 作者机构:[1]School of Information and Engineering, Ningbo Dahongying University, Ningbo 315175, China, [2]Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices,School of Microelectronics, Xidian University, Xi'an 710071, China
- 相关基金:Project supported by the National Natural Science Foundation of China (No.61006060); the Scientific Research Foundation of the Ningbo Dahongying University (No.GY112111); the Scientific Research of Education Bureau of Zhejiang Province (No.Y201122504)
关键词:
4H-SiC, 第一原理计算, 固有缺陷, 平衡浓度, 第一性原理, VSI, 形成能, 超级单体, first-principles, intrinsic defects, formation energy
中文摘要:
Corresponding author. Email: chpzmm@yahoo.com.cn