位置：成果数据库 > 期刊 > 期刊详情页
Investigation of initial epitaxial growth of (Ba, Sr)TiO3 thin film on (001) SrTiO3 substrate using
  • ISSN号：0925-8388
  • 期刊名称：JOURNAL OF ALLOYS AND COMPOUNDS
  • 时间：2013.5.5
  • 页码：11-15
  • 相关项目：钛酸锶钡铁电复合薄膜的生长机理、结构及性能研究
作者： Wei, L. J.|Guo, J. X.|Ge, D. Y.|Dai, X. H.|Guan, L.|Wang, Y. L.|Liu, B. T.|
同期刊论文项目
钛酸锶钡铁电复合薄膜的生长机理、结构及性能研究
期刊论文 44
同项目期刊论文
含铜铁电电容器SrRuO3/Pb(Zr0.4Ti0.6)O3/SrRuO3/Ni-Al/Cu/Ni-Al/SiO2/Si异质结的研究
含Ni-Al阻挡层的硅基BiFe0.95Mn0.05O3铁电电容器的结构与物理性能
Effect of purple light on the ferroelectric and transport properties of epitaxial Mn-doped BiFeO3 fi
硅基外延SrRuO_3/PbZr_(0.5)Ti_(0.5)O_3/SrRuO_3电容器的结构和性能研究
(La_(0.5)Sr_(0.5))CoO_3为电极的Pb(Zr_(0.4)Ti_(0.6))O_3和Pb(Zr_(0.2)Ti_(0.8))O_3铁电电容器结构及电学性能
含Ni-Nb阻挡层的硅基Pb(Zr_(0.4),Ti_(0.6))O_3电容器的制备及铁电性能研究
保持温度对偏轴磁控溅射法制备BiFeO_3薄膜结构和性能的影响
Ultrathin amorphous Ti-Al film used as a diffusion barrier for copper metallization
Dissociation and reconstruction of O-2 on Al (111) studied by First-principles
不同电极对外延BiFeO_3薄膜铁电性能的影响
EFFECTS OF POST-ANNEALING ON THE MICROSTRUCTURAL AND ELECTRICAL PROPERTIES OF AMORPHOUS LaAlO3 FILM
Ultrathin amorphous Ni-Ti film as diffusion barrier for Cu interconnection
Investigation of Pt/Pb(Zr­0.2Ti0.8)O3/Ti-Al-O/Si heterostructure as metal/ferroelectric/insulato
Self-assembled 1-3 type Fe:LaSrFeO4 epitaxial nanocomposite film prepared by pulsed laser deposition
Investigation of leakage current behavior of Pt/Bi0.975La0.025Fe0.975Ni0.025O3/Pt capacitor measured
快速退火对Ni-Al-O 栅介质结构和介电性能的影响
Pb 过量对以 Ti- Al 为阻挡层的硅基铁电电容器极化翻转性能的影响
Investigation of amorphous Ni-Al-N film as diffusion barrier between Cu and SiO2
Temperature dependence of rapid thermal annealed Ba0.6Sr0.4Ti03 thin film fabricated on platinized S
非晶Ti-Al过渡层对Pt/Ba0.6Sr0.4TiO3/Pt电容器结构和性能的影响
以Ni-Al为底电极的P(VDF-TrFE)铁电电容器的结构与性能
Oxygen vacancy as fatigue evidence of La(0.5)Sr(0.5)CoO(3)/PbZr(0.4)Ti(0.6)O(3)/La(0.5)Sr(0.5)CoO(3)
Epitaxial SrRuO3/BiFeO3/SrRuO3 heterostructure sputtered at low temperature
沉积温度对磁控溅射BiFeO3薄膜结构和性能的影响
Enhanced photovoltaic effect of polycrystalline BiFeO3 film
Oxygen adsorption on Al (111) surface interstitial site calculated by density functional theory
硅基外延SrRuO3／PbZr0．5Ti0．5O3／SrRuO3电容器的结构和性能研究
含Ni-Nb阻挡层的硅基Pb（Zr0．4，Ti0．6）03电容器的制备及铁电性能研究
含Ni-Al阻挡层硅基BiFe0.95Mn0.05O3铁电电容器的结构及物理性能
沉积温度对BiFeO_3薄膜结构和性能的影响
非晶Ni-Al-N薄膜用作Cu互连阻挡层的研究
含Ti电极的非晶钛酸锶薄膜的阻变开关特性研究
紫光对多晶掺锰铁酸铋薄膜铁电和电输运性质的影响
（001）高度择优取向Ba_（0.6）Sr_（0.4）TiO_3/Pt异质结的结构及性能
含铜铁电电容器SrRuO_3/Pb（Zr_（0.4）Ti_（0.6））O_3/SrRuO_3/Ni-Al/Cu/Ni-Al/SiO_2/Si异质结的研究
氮氢混合气氛退火中氢对Bi4Ti3O12铁电性能的影响
溶胶-凝胶法制备Bi_（0.975）La_（0.025）Fe_（0.975）Ni_（0.025）O_3铁电薄膜的结构及物理性能
不同电极对外延BiFeO3薄膜铁电性能的影响
Pb过量对以Ti-Al为阻挡层的硅基铁电电容器极化翻转性能的影响
紫光对外延掺锰铁酸铋薄膜物性的影响