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Ultrathin amorphous Ni-Ti film as diffusion barrier for Cu interconnection
  • ISSN号：0169-4332
  • 期刊名称：APPLIED SURFACE SCIENCE
  • 时间：2011.1.1
  • 页码：2920-2922
  • 相关项目：钛酸锶钡铁电复合薄膜的生长机理、结构及性能研究
作者： Zhang, X. Y.|Yang, L.|Li, X. H.|Wang, K. M.|Guo, Z.|Chen, J. H.|Li, M.|Zhao, D. Y.|Zhao, Q. X.|
同期刊论文项目
钛酸锶钡铁电复合薄膜的生长机理、结构及性能研究
期刊论文 44
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