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Ultrathin amorphous Ti-Al film used as a diffusion barrier for copper metallization
  • ISSN号：0947-8396
  • 期刊名称：APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSI
  • 时间：2013.6.6
  • 页码：841-844
  • 相关项目：钛酸锶钡铁电复合薄膜的生长机理、结构及性能研究
作者： Liu, B. T.|Zhao, D. Y.|Xing, J. Z.|Yang, L.|Zhang, X. G.|Guo, J. X.|Li, X. H.|Ma, L. X.|Zhang, X. Y.|
同期刊论文项目
钛酸锶钡铁电复合薄膜的生长机理、结构及性能研究
期刊论文 44
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