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An investigation into ultra-thin pseudobinary oxide (TiO2)x(Al2O3)1-x films as high-k gate dielectri
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  • 相关项目：适用于65nm技术代以后的CMOS器件栅工程和沟道工程关键技术研究
同期刊论文项目
适用于65nm技术代以后的CMOS器件栅工程和沟道工程关键技术研究
期刊论文 36 会议论文 5
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