中文摘要：

为了进一步研究共振吸收在飞秒激光烧蚀加工中对靶材烧蚀阈值的影响,针对具有特定吸收光谱的掺Pr-Nd硅玻璃(Pr-Nd玻璃)和无特定吸收的石英玻璃,分别采用共振吸收波长585,807 nm和非共振吸收波长720,775 nm对2种靶材进行烧蚀加工,并基于烧蚀轮廓,提出一种靶材烧蚀阈值的计算方法。研究结果表明:在烧蚀阈值附近,靶材的初始种子电子产生方式主要为多光子电离;Pr-Nd玻璃在共振波长585 nm和807 nm的作用下,多光子电离较为剧烈,烧蚀轮廓长度较石英玻璃分别增长19.8%和6.8%,且对于加工波长807 nm,烧蚀阈值较石英玻璃降低12.3%;而对于非共振波长720 nm和775 nm的烧蚀加工,共振烧蚀效应消失,2种靶材的烧蚀轮廓长度和烧蚀阈值基本一致。

英文摘要：

In order to further understand the influence of resonant absorption on ablation threshold fluency of femtosecond laser ablating target, two kinds of wavelength (resonant wavelengths 585 nm and 807 nm, and nonresonant wavelengths 720 nm and 775 nm) were adapted to process Pr-Nd doped silicate glass (Pr-Nd Glass), which owned special absorption spectrum, and ordinary fused silica. Based on ablating profiles, a computing method for calculating ablation threshold fluency was put forward. The results show that the approach of producing initial seed electron is mainly multiphoton ionization near ablation threshold fluencies of the two targets, and the multiphoton ionization is extremely strong when Pr-Nd Glass is ablated by the resonant wavelengths 585 nm and 807 nm. Compared with fused silica, the lengths of ablation profiles increase respectively by 19.8% and 6.8% ablated with these two wavelengths. For wavelength 807 nm, the ablation threshold fluency decreases by 12.3% compared with that of fused silica. However, the resonant ablation efficiencies fade away ablated with the nonresonant wavelengths 720 nm and 775 nm, and there are substantial agreement for the lengths of ablation profiles and the ablation threshold fluencies of the two targets.