用两步法制备了SnS薄膜,首先在玻璃衬底上用磁控溅射法沉积-层Sn薄膜,然后在220℃下加热炉中硫化60min.对该薄膜进行结构、表面形貌和光电性能分析,结果表明:制备的SnS薄膜为P型导电,有明显的(040)方向择优取向;薄膜表面致密,S和Sn原子非常接近化学计量比;薄膜呈现高于5×10^4cm叫的吸收系数和持续光电导效应,其直接带隙约为1.23eV,适合作为太阳能电池的吸收层材料和用于制作光敏器件.
SnS thin films were prepared by two-stage process. Sn precursor layers were deposited on glass suhstrates by sputtering and followed by sulfurization of the metallic tin precursor layers at 220 ℃ in a furnace for 60 min. The characterization results of microstructures, composition and optical and electrical properties show that the SnS film presents p-type conductivity and has a (040) preferred grain orientation; SnS film has an orthorhombic structure, and the surface is uniform and density with the ratio of Sn to S close to 1. It is found that the film shows a high optical absorption coefficient of 5 × 104 cm-1 and persistent photoeonductivity effect. It has a direct energy band gap of 1.23 eV. The prepared SnS film is useful as an absorption layer of solar cells and for fabrication of photo-sensitive device.