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Thermal annealing effects on a compositionally graded SiGe layer fabricated by oxidizing a strained
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：0
  • 页码：5363-5366
  • 语言：英文
  • 相关项目：Si基高效率发光新结构制备研究
作者： Xu, Jianfang|Zhang, Yong|Chen, Songyan|Li, Cheng|Lai, Hongkai|Cai, Kunhuang|
同期刊论文项目
Si基高效率发光新结构制备研究
期刊论文 28 会议论文 2 专利 1
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