欢迎您！东篱公司
退出
-
申报数据库
-
立项数据库
-
成果数据库
-
项目获奖数据库
中文摘要：
采用脉冲激光烧蚀装置，在不同环境气体下，沉积制备了含有纳米Si晶粒的薄膜。利用扫描电子显微镜（SEM）观察样品的表面形貌，并对晶粒尺寸进行统计分析．发现不同环境气体下，纳米Si晶粒平均尺寸均随衬底与靶的距离增加有着先增大后减小的规律；通过分析比较，同等条件下Ne气环境下制备的纳米si晶粒平均尺寸最小。
英文摘要：
The nanocrystalline silicon films containing nanoparticles were prepared by pulsed laser ab- lation in different ambient gas. Surface morphology of the Si film was observed by scanning electron microscopy （SEM） and was found that the average size of Si nanoparticles prepared in different gas all increased initially and then decreased with distance between the target and the substrate increasing. The average size of Si nanoparticles was the smallest under the condition of Ne ambient gas.
同期刊论文项目
同项目期刊论文
The elimination of deviations of the mean-field Landau-type theory from the fancy size effect experi
The difference of energies of Si atoms with single-crystalline,amorphous,free and nanoparticle confi
Dynamical transportation of Si particles produced by pusled laser ablation in the mixture of two ine
期刊信息
位置：