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The chemistry and thermal stability of HfTaO/Si interface by x-ray photoelectron spectroscopy
  • ISSN号：0142-2421
  • 期刊名称：Surface and Interface Analysis
  • 时间：0
  • 页码：395-398
  • 相关项目：双频调制等离子体和双离子束制备复合铪基高k薄膜机理及物理特性
作者： Yu, T.|Jin, C.G.|Yang, X.M.|Wu, X.M.|Zhuge, L.J.|Ge, S.B.|
同期刊论文项目
双频调制等离子体和双离子束制备复合铪基高k薄膜机理及物理特性
期刊论文 15 会议论文 2 著作 2
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