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Effect of NH3 plasma treatment on the interfacial property between ultrathin HfO2 and strained Si0.6
  • 期刊名称：J. Appl. Phys.
  • 时间：0
  • 页码：1-7
  • 相关项目：双频调制等离子体和双离子束制备复合铪基高k薄膜机理及物理特性
作者： T. Yu, C. G. Jin, Y. Yang, L. J. Zhuge, X. M. Wu,|
同期刊论文项目
双频调制等离子体和双离子束制备复合铪基高k薄膜机理及物理特性
期刊论文 15 会议论文 2 著作 2
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