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Experimental Investigation of Border Trap Generation in InGaAs nMOSFETs With Al2O3 Gate Dielectric U
ISSN号:0018-9383
期刊名称:IEEE Transactions on Electron Devices
时间:2012
页码:1661-1667
相关项目:纳米CMOS器件的可靠性表征技术、失效机理及预测模型研究
作者:
G. F. Jiao|C. J. Yao|Y. Xuan, et al.,|
同期刊论文项目
纳米CMOS器件的可靠性表征技术、失效机理及预测模型研究
期刊论文 74
会议论文 27
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