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Comprehensive understanding of the effect of electric dipole at high-k/SiO2 interface on the flatban
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：2010.8.9
  • 页码：1-3
  • 相关项目：HfMxOy/金属栅界面控制及有效功函数调制机理
作者： Zhang, Jing|Du, Jun|Xiong, Yuhua|Huang, Anping|
同期刊论文项目
HfMxOy/金属栅界面控制及有效功函数调制机理
期刊论文 55 会议论文 3
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