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Effects of plasma immersion ion nitridation on dielectric properties of HfO2
  • 期刊名称：Appl. Phys. Lett.
  • 时间：2007
  • 页码：122-901
  • 相关项目：HfMxOy/金属栅界面控制及有效功函数调制机理
作者： K. Xue| J. B. Xu|A. P. Huang|P. K. Chu|
同期刊论文项目
HfMxOy/金属栅界面控制及有效功函数调制机理
期刊论文 55 会议论文 3
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