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Plasma nitridated high-k polycrystalline array induced by electron irradiation
  • ISSN号：0957-4484
  • 期刊名称：Nanotechnology
  • 时间：2006
  • 页码：4379-4383
  • 相关项目：HfMxOy/金属栅界面控制及有效功函数调制机理
作者： A. P. Huang|L. Wang|J. B. Xu|P. K. Chu|
同期刊论文项目
HfMxOy/金属栅界面控制及有效功函数调制机理
期刊论文 55 会议论文 3
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