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HfO2 dielectric film growth directly on graphene by H2O-based atomic layer deposition
  • ISSN号：0734-2101
  • 期刊名称：Journal of Vacuum Science & Technology A
  • 时间：2014
  • 页码：01A103-
  • 相关项目：Ⅲ-Ⅴ族半导体衬底上铪基高k栅介质界面特性研究
作者： Li Zheng, *Xinhong Cheng, Duo Cao, Zhongjian Wang, Dawei Xu|
同期刊论文项目
Ⅲ-Ⅴ族半导体衬底上铪基高k栅介质界面特性研究
期刊论文 21 会议论文 2
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