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Effects of rapid thermal annealing on properties of HfAlO films directly deposited by ALD on graphen
  • ISSN号：0
  • 期刊名称：Materials Letters
  • 时间：2014
  • 页码：200-202
  • 相关项目：Ⅲ-Ⅴ族半导体衬底上铪基高k栅介质界面特性研究
作者： Li Zheng, *XinhongCheng, DuoCao, ZhongjianWang, DaweiXu, Ch|
同期刊论文项目
Ⅲ-Ⅴ族半导体衬底上铪基高k栅介质界面特性研究
期刊论文 21 会议论文 2
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