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Kinematic optimization for chemical mechanical polishing based on statistical analysis of particle t
  • ISSN号：0894-6507
  • 期刊名称：IEEE Transactions on Semiconductor Manufacturing
  • 时间：2013
  • 页码：556-563
  • 相关项目：微纳制造中的表面/界面行为及控制技术研究
作者： Zhao, Dewen|Wang, Tongqing|He, Yongyong|Lu, Xinchun|
同期刊论文项目
微纳制造中的表面/界面行为及控制技术研究
期刊论文 85 会议论文 3 获奖 22 专利 63
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