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Spectroscopic ellipsometry study of thin NiO films grown on Si (100) by atomic layer deposition
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：0
  • 页码：2630-2643
  • 语言：英文
  • 相关项目：原子层淀积高介电常数栅介质的界面层抑制和性能调控
作者： Alia, M.|Scarel, G.|Lu, H. L.|Ding, Shi-Jin|Fanciulli, M.|Zhang, David Wei|
同期刊论文项目
原子层淀积高介电常数栅介质的界面层抑制和性能调控
期刊论文 27
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