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Use of water vapor for suppressing the growth of unstable low-k interlayer in HfTiO gate- dielectric
  • ISSN号：0040-6090
  • 期刊名称：Thin Solid Films
  • 时间：0
  • 页码：2892-2895
  • 语言：英文
  • 相关项目：小尺寸超薄HfTiO/GeON叠层高k栅介质Ge基MOSFET研究
作者： J. P. Xu, X. Zou, P. T. Lai, C. X. Li, C. L. Chan|
同期刊论文项目
小尺寸超薄HfTiO/GeON叠层高k栅介质Ge基MOSFET研究
期刊论文 30 会议论文 7
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