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Effect of low-frequency power on etching of SiCOH low-k films in CHF3 13.56MHz/2MHz dual-frequency c
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  • 相关项目：纳电子器件中超低k多孔SiCOH薄膜的ECR等离子体加工及相关复杂性研究
同期刊论文项目
纳电子器件中超低k多孔SiCOH薄膜的ECR等离子体加工及相关复杂性研究
期刊论文 28 会议论文 1
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