位置：成果数据库 > 期刊 > 期刊详情页
Measurement technique for characterizing odd aberration of lithographic projection optics based on d
  • ISSN号：0030-4018
  • 期刊名称：Optics Communications
  • 时间：2010
  • 页码：2309-2317
  • 相关项目：超大数值孔径光刻成像与图形保真技术研究
作者： Peng, Bo|Wang, Xiangzhao|Qiu, Zicheng|Yuan, Qiongyan|
同期刊论文项目
超大数值孔径光刻成像与图形保真技术研究
期刊论文 70 会议论文 20 专利 75
同项目期刊论文
Even aberration measurement of lithographic projection optics based on intensity difference of adjac
旋转波片法偏振检测装置器件参数校准
基于单光弹调制器的米勒矩阵测量技术
Vectorial mask optimization methods for robust optical lithography
宽视场角1/4波片装调和加工误差对偏振检测的影响
掩模衍射频谱轴向分量对光刻成像性能的影响
波片对斜入射光波产生相位延迟的两种计算方法
模拟光刻中双层衰减相移接触孔衍射的理论公式
超高数值孔径schwarzschild投影光刻物镜的光学设计
High spatial resolution zonal wavefront reconstruction with improved initial value determination sch
基于空间像峰值光强差的奇像差测量技术
高阶截断误差的斜率和曲率混合型波前重构算法
二维虚光栅移相莫尔条纹相位提取算法
一种提高偏振光斯托克斯参量测量精度的方法
一种基于线性模型的光刻投影物镜偏振像差补偿方法
二维快速傅里叶变换干涉图相位提取误差分析
Robust pixel-based source and mask optimization for inverse lithography
Evolution properties of the intensity distribution of an anisotropic Gaussian Schell-model beam in a
In situ aberration measurement technique based on principal component analysis of aerial image
Analytical approach to the impact of polarization aberration on lithographic imaging
Far-zone polarization distribution properties of partially coherent beams with non-uniform source po
Generalized zonal wavefront reconstruction for high spatial resolution in lateral shearing interfero
Two-dimensional wavelet transform for reliability-guided phase unwrapping in optical fringe pattern
Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging
Polarization distribution control of anisotropic electromagnetic Gaussian-Schell model beams on free
Modal wavefront reconstruction based on Zernike polynomials for lateral shearing interferometry: Com
Use of numerical orthogonal transformation for the Zernike analysis of lateral shearing interferogra
In situ aberration measurement technique based on multi-illumination settings and principal componen
Practical application of aerial image by principal component analysis to measure wavefront aberratio
超大数值孔径光刻中掩模保护膜优化及偏振像差研究
Optimal 3D phase-shifting masks in partially coherent illumination
Calibration method to characterize the accuracy of phase-shifting point diffraction interferometer
Resolution enhancement optimization methods in optical lithography with improved manufacturability
含中心遮拦剪切干涉图的波前重建新方法
一种新的相移点衍射干涉仪系统误差标定方法
一种新的基于线性载波延拓的相位展开方法
相移点衍射干涉仪的高精度对准
Analysis and optimization approaches for wide-viewing-angle lambda/4 plate in polarimetry for immers
Block-based mask optimization for optical lithography
Pixelated source and mask optimization for immersion lithography
Simulation of the polarization effects induced by the bilayer absorber alternating phase-shift mask
Two methods to loosen optical manufacture tolerances for ArF projection optics
Approach to characterize manufacture tolerances of two-dimensional cross-phase grating
Mask optimization approaches in optical lithography based on a vector imaging model
In situ aberration measurement technique based on an aerial image with an optimized source
基于单光弹调制器的米勒矩阵测量误差分析
Polarization effects induced by the bi-layer attenuated phase-shiftmask and their impacts on near-fi
Two-wavelength sinusoidal phase-modulating interferometer for nanometer accuracy measurement
Sinusoidal phase-modulating interferometer insensitive to intensity modulation of a laser diode for
Improving wavefront reconstruction accuracy by using integration equations with higher-order truncat
Sinusoidal phase-modulating laser diode interferometer insensitive to intensity modulation for real-
双液体层消色差氩氟浸没干涉光刻性能分析
Hybrid source mask optimization for robust immersion lithography
基于视觉仿生原理的四通道时分复用大气偏振检测技术
高精度平面子孔径拼接算法研究
90 nm DUV光刻物镜重力变形及其对波像差影响分析
旋转波片法成像斯托克斯偏振仪误差标定和补偿
三维全深度复频域光学相干层析成像系统及其对人体皮肤的在体成像
消除光强调制影响的双波长正弦相位调制干涉仪
平面面形绝对检验技术测量误差分析
基于米氏散射理论的太阳光散射偏振特性
偏振正交误差对偏振光导航定位系统测量精度的影响
投影光刻物镜波像差的公差分析方法
嵌入式光栅多层结构锥形衍射的严格耦合波理论研究