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Hybrid source mask optimization for robust immersion lithography
  • ISSN号：0003-6935
  • 期刊名称：Applied Optics
  • 时间：2013.6.6
  • 页码：4200-4211
  • 相关项目：超大数值孔径光刻成像与图形保真技术研究
作者： Ma, Xu|Han, Chunying|Li, Yanqiu|Wu, Bingliang|Song, Zhiyang|Dong, Lisong|Arce, Gonzalo R.|
同期刊论文项目
超大数值孔径光刻成像与图形保真技术研究
期刊论文 70 会议论文 20 专利 75
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