采用MOCVD法在c面蓝宝石衬底上生长出了高质量的MgxZn1-xO薄膜.研究了退火对MgxZn1-xO薄膜各种特性的影响.将样品分别在真空和氧气中退火1h.X射线衍射研究发现,在真空中,尤其是在氧气中退火的样品的(002)峰均增强.由原子力显微镜观察发现,在真空中退火样品的表面与未退火样品的表面几乎相同,而在氧气中退火后样品的表面变得光滑了很多.从光致发光光谱中发现,真空退火后的样品的紫外光谱峰显著增强,而深能级发射峰几乎消失.在氧气中退火后样品的紫外光谱峰减弱而深能级发射峰显著增强.所以退火对MgxZn1-xO薄膜的各种性质具有重要的影响,通过退火可调节MgxZn1-xO的晶体质量与光学质量.
High-quality MgxZn1-xO thin films were grown at 610 ℃ on c-sapphire substrates by metal-organic chemical vapor deposition (MOCVD). To research the effect of anneal on the characteristics of MgxZn1-xO,MgxZn1-xO were annealed in vacuum and oxygen for 1 h, respectively. We can find the (002) peaks of the samples which were annealed in vacuum and oxygen are both enhanced, especially in oxygen measured by XRD. From the PL spectrum, the UV emission peak of the sample annealed in vacuum increase clearly and deep-level emission peak minish. The UV emission of the sample annealed in oxygen weakened and the deeplevel emission peak enhanced remarkably due to the concentration of vacancy oxygen. It is shown that anneal can regulate the crystal, optical and electrical qualities of MgxZn1-xO film.