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平面研磨抛光轨迹研究
  • 期刊名称：航空精密制造技术，Vol.45 No.2(2009)：1-6
  • 时间：0
  • 分类：TG580.68[金属学及工艺—金属切削加工及机床]
  • 作者机构：浙江工业大学教育科学与技术学院, 浙江工业大学机械制造与自动化教育部重点实验室, 湖南大学国家高效磨削工程技术研究中心
  • 相关基金：国家自然科学基金重点资助项目(50535040)
  • 相关项目：先进陶瓷精密高效加工技术基础研究
关键词： 平面研磨, 平面抛光, 研磨轨迹, 轨迹均匀性
中文摘要：

介绍了平面研磨抛光轨迹均匀性的研究方法,详细阐述了双轴式(包括定偏心式和不定偏心式)、直线式、摇摆式、计算机控制小工具式单面研磨抛光轨迹和行星式双面研磨抛光轨迹的数学函数及其轨迹均匀性,指出了当前轨迹研究中存在的不足。

同期刊论文项目
先进陶瓷精密高效加工技术基础研究
期刊论文 60 会议论文 7 获奖 4 著作 2
同项目期刊论文
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Research on Ultra-precision Lapping Technology for Super-smooth Surface of KTP Crystal
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