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Surface passivation of the Ge substrate by novel nitrogen plasma immersion treatment
  • 期刊名称：Semiconductor Science Technology
  • 时间：2013
  • 页码：085010-085010
  • 相关项目：硅基纳米尺度新结构器件
作者： Meng Lin|Ming Li|Xia An|Quanxin Yun|Min Li|Zhiqiang Li|Pengqiang Liu|Xing Zhang|Ru Huang|
同期刊论文项目
硅基纳米尺度新结构器件
期刊论文 29 会议论文 15 获奖 4 专利 19
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