中文摘要：

根据Sigmund溅射能量沉积理论建立了低能离子入射光学元件引起的能量扰动层厚度模型．理论推导了离子束倾斜入射时光学元件表面的束流密度，并建立了低能离子束对光学元件的热量沉积模型．采用MonteCarlo方法模拟了低能离子与熔石英光学表面的相互作用．分析了离子能量、离子类型、入射角度等参数对光学元件热量沉积和扰动层深度的影响规律．以离子束沉积在工件的能量作为热源，采用有限元分析软件ANSYS模拟了离子束入射工件的温度场分布、温度梯度场分布和温度应力分布．入射表面温度和热梯度呈高斯分布，束斑中心最高并向工件边缘逐渐减小．入射表面束斑区域受热膨胀，其膨胀受到外环区域的制约，从中心区域到大约束斑半峰值半径的区域，所受环向应力为压应力，在大致束斑半峰值半径以外区域为拉应力．

英文摘要：

Based on energy deposition theory of Sigmund, the model of thickness of energy perturbation layer caused by low energy ion bombarding optical surface is built up. Beam current density on the optical surface is obtained by theory analysis, and the model of thermal deposition caused by low energy ion bombarding optical surface is built up. TRIM program is used to simulate the collision between low energy ions and atoms on the optical surface. And then, contributions to the thermal deposition and energy perturbation layer thickness from parameters such as ion energy, ion type and incidence angle are discussed. Finally, by taking the thermal quantity of deposited workpiece as a heat source in ANSYS, temperature field, thermal gradient field and stress field of the workpiece are obtained. The temperature and thermal gradient of the surface radiated by ion beam each present a Gaussian profile, and decrease along the radius from the center to the edge. The stress on the surface is a compressive stress within the radius of Half Maxim, and it is a tension-tension stress from the radius of Half Maxim to the edge.