利用自组装单层膜技术,在玻璃基板上生长十八烷基三氯硅烷(0TS)单分子膜层,以Hf(SO4)2·4H2O和HCl配制HfO2前驱液,通过液相沉积在硅烷的功能性官能团上诱导生成二氧化铪薄膜。研究了紫外光照射对OTS单分子层的影响,通过接触角测试仪、AFM、SEM及XRD等手段对膜材料的表面形貌和结构进行了研究分析。结果表明,利用自组装单层法成功制备出HfO2晶态薄膜,呈立方型的HfO2,无其它杂相,薄膜表面均一。
An alkyl silane layers on the hydroxylated surface of the glass substrates were prepared via the method of self-assembled monolayers (SAMs), Hf(SO4 )2 · 4H2O and HCl were used as raw materials, HfO2 thin films were prepared on the active groups of the alkyl silane by the liquid phase deposition(LPD), water contact angle of OTS-SAMs irradiated by UV light was studied. The surface configuration and structure of the thin films were characterized and analyzed by water contact angle equipment, AFM , SEM and XRD. The results of the characterization indicate that the HfO2 thin films were successfully prepared by the self-assembled monolayers , and the thin films were uniform and dense with a cubic microstructures of HfO2.