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中文摘要：
用一种新的化学溶液沉积方法在双轴织构NiW（200）合金基底上制备了涂层导体用稀土氧化物RE203（RE=Y,Sm，Eu，Dy,Yb）缓冲层。分别利用X射线衍射，扫描电子显微镜，原子力显微镜对制得的RE2O3缓冲层的相结构、织构、表面形貌和平整度进行了检测。结果表明，RE2O3缓冲层具有较好的双轴织构，表面平整无裂纹。
英文摘要：
A novel chemical solution deposition approach was employed for the preparation of coated-conductor-used RE203 （RE=Y, Sm, Eu, Dy, Yb） buffer layers on the biaxial NiW（200） alloy substrate. X-ray diffraction （XRD）, scanning electron microscope （SEM）, and atomic force microscope （AFM） were used to characterize the phase structure, texture, surface morphology and roughness of the as-received RE2O3 buffer layers. Results show that the obtained RE2O3 buffer layers have well biaxial texture and their surface is smooth and crack free.
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