位置:成果数据库 > 期刊 > 期刊详情页
MOCVD生长中载气H2对N掺杂ZnO性质的影响
  • ISSN号:1000-7032
  • 期刊名称:《发光学报》
  • 时间:0
  • 分类:O482.31[理学—固体物理;理学—物理]
  • 作者机构:[1]南京大学物理系江苏省光电功能材料重点实验室,江苏南京210093
  • 相关基金:基金项目:国家重点基础研究规划(G001CB3095);国家自然科学基金(60276011,60390073);国家“863”计划(2002AA311060)资助项目
中文摘要:

采用MOCVD方法在石英衬底上生长ZnO。实验使用二乙基锌(DEZn)为锌源,N2O作为氧和氮源,H2作为载气。采用PL和Raman光谱方法对ZnO样品进行表征,结果表明H2的加入大幅度减少薄膜中碳的掺入,明显改善了薄膜的光学质量。采用N2O离化技术,可以进一步提高其带边峰的强度,抑制带内发光。XRD测量表明,生长的ZnO薄膜具有c轴择优取向。目前生长高质量N掺杂的P型ZnO薄膜是很困难的,而H2作为载气的加入明显改善了ZnO薄膜的光学性质,在生长过程中加入H2将为获得高质量N掺杂的P型ZnO薄膜提供一种途径。

英文摘要:

As a versatile wide band gap semiconductor material, ZnO has a variety of applications including gas sensors, piezoelectric devices, field effect transistors, solar cells, and so on. Particularly, the application of ZnO in blue and ultraviolet light emitting diodes (LED) and laser diodes (LD) have attracted much attention in the past ten years, because it has the wide-bandgap of 3.37 eV at room temperature (RT) and the large exciton binding energy of 60 meV. Many growth techniques for single-crystalline ZnO films have been used, such as molecular beam epitaxy (MBE), metal-organic chemical vapour deposition (MOCVD) , RF magnetron sputtering, and pulsed laser deposition (PLD). Among these techniques, MOCVD has many advantages for the semiconductors production and has been used to manufacture many semiconductor devices. MOCVD growth of ZnO requires appropriate zinc and oxygen precursor. For the group 11 element, the mostly used zinc precursor is a metal-organic compounds like diethyl (DEZn) and dimethyl (DMZn). For the group VI precursor, a large number of oxygen-containing compounds was widely used: gases like 02, CO2, NO, N2O;water and several types of organic compounds like alcohols, aldehydes, ketons. During the growth of ZnO, kinds of carrier gas were used to introduce zinc and oxygen precursor into growth chamber. Because of the huge volume of the carrier gas and the likely reaction with zinc precursor or oxygen precursor, it has the obvious influence on the quality of ZnO. In this experiment, argon( Ar), nitrogen (N2)and hydrogen (H2) were used to compare their effect on the growth of ZnO; DMZn were used as the zinc precursor and N2O as oxygen precursor. ZnO films were grown on quartz substrate by LP-MOCVD. Crystalline quality, and Optical properties were studied with photoluminescence, X-ray diffraction (XRD) using Cu Kct (λ=0.154 056 nm), Raman spectra. The growth rate of ZnO was measured with the step profiler. Compared to Ar, the optical properties we

同期刊论文项目
期刊论文 115 会议论文 10
同项目期刊论文
期刊信息
  • 《发光学报》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国物理学会发光分会 中国科学院长春光学精密机械与物理研究所
  • 主编:申德振
  • 地址:长春市东南湖大路3888号
  • 邮编:130033
  • 邮箱:fgxbt@126.com
  • 电话:0431-86176862
  • 国际标准刊号:ISSN:1000-7032
  • 国内统一刊号:ISSN:22-1116/O4
  • 邮发代号:12-312
  • 获奖情况:
  • 物理学类核心期刊,2000年获中国科学院优秀期刊二等奖,中国期刊方阵“双效”期刊
  • 国内外数据库收录:
  • 美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:7320