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中文摘要：
用脉冲偏压电弧离子镀技术在玻璃基片上制备均匀透明的TiO2薄膜.利用X射线衍射仪、原子力显微镜、扫描电子显微镜、紫外-可见透射光谱仪和纳米压痕仪等手段,对不同脉冲负偏压下合成薄膜的相结构、微观结构、表面形貌、力学和光学性能进行表征.结果表明,沉积态薄膜为非晶态.脉冲负偏压对薄膜性能有明显的影响.随偏压的增加,薄膜厚度、硬度和弹性模量均先增大后减小,前者峰值出现在100—200V负偏压范围,后两者则在250—350V范围.300V负偏压时薄膜硬度最高,薄膜达到原子级表面光滑度,均方根粗糙度为0.113nm,薄膜折射率也最高,对波长为550nm光的折射率达到已有报道的最高值（2.51）.同时,对脉冲负偏压影响薄膜性能的机理进行了分析.
英文摘要：
Uniform and transparent titanium dioxide films were successfully deposited on glass by pulsed bias arc ion plating. Phase structure, surface morphology, microstructure, optical property and hardness of the films deposited at different biases were measured with X-ray diffractometer, atomic force microscope, scanning electron microscope, ultraviolet-visible spectrophotometer and nanoindenter. The results show that the deposited films are amorphous, and the pulsed negative bias plays a key role on the film properties. With the increase of the bias, the film thickness, hardness and elastic modulus change in a similar manner. They all first rise, and then decline, The film thickness reaches a peak in the range from - 100 to - 200 V, and the latter two parameters reach peak values when the bias ranges from - 250 to - 350 V. The film deposited at - 300 V has atomic smooth surface, Rrms = 0. 113 nm, and highest refractive index of n550 = 2.51, which is greater than or equal to the maximum value ever reported. At this bias, the film has the best general properties. The mechanism of how the bias affects film properties is also discussed.
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