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自支撑透射光栅的设计、制作和测试
  • 期刊名称：物理学报
  • 时间：0
  • 页码：-
  • 分类：TU356.04[建筑科学—结构工程]
  • 作者机构：[1]中国科学院微电子研究所,纳米加工与新器件集成研究室,北京100029
  • 相关基金：国家重点基础研究发展计划（批准号：2007CB935302 2006CB806204）; 国家自然科学基金（批准号：60825403）资助的课题
  • 相关项目：纳米加工与新型半导体器件研究
作者： 马杰|谢常青|叶甜春|刘明|
关键词： 自支撑透射光栅, 电子束光刻, 电镀, freestanding transmission grating, electron beam lithography, electroplating
中文摘要：

采用标量衍射理论和严格耦合波理论分别计算和讨论了金自支撑透射光栅的衍射效率随波长和光栅周期变化的情况并设计了光栅的结构参数.制作了周期为300nm、线宽/周期比为0.55、厚度为200nm、总面积为1mm×1mm、有效面积比为65%的金自支撑透射光栅.在国家同步辐射实验室检测了该光栅在5.5—38nm波长范围内的绝对衍射效率.检测结果表明所制作的光栅在8nm附近具有接近10%的最大衍射效率,并且该光栅对于波长15—35nm范围内的极紫外波段具有基本稳定的衍射效率.

英文摘要：

The diffraction efficiency of freestanding x ray transmission gratings is discussed in relation to the wavelength and grating period using both scalar diffraction theory and rigorous coupled wave analysis,and the grating design is accordingly optimized.A gold freestanding x ray transmission grating with period of 300 nm,line/period ratio of 0.55,thickness of 200 nm a size of 1 mm × 1 mm and fractional grating area of 65% is fabricated.The absolute diffraction efficiency of the fabricated grating was tested at the National Synchrotron Radiation Laboratory in the wavelength region of 5.5—38 nm.The test result shows that the grating has a maximum efficiency of nearly 10%.The grating also shows a stable diffraction efficiency in the wavelength region from 15 nm to 35 nm.

同期刊论文项目
纳米加工与新型半导体器件研究
期刊论文 101 会议论文 13 获奖 2 专利 121
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