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Collector optimization for improving the product of the breakdown voltage-cutoff frequency in SiGe HBT
  • ISSN号:1674-4926
  • 期刊名称:《半导体学报:英文版》
  • 时间:0
  • 分类:TN386.1[电子电信—物理电子学] TN325.3[电子电信—物理电子学]
  • 作者机构:[1]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China, [2]College of Physics, Liaoning University, Shenyang 110036, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (Nos. 60776051, 61006059, 61006044), the Beijing Natural Science Foundation (Nos. 4082007, 4143059, 4142007, 4122014), and the Beijing Municipal Education Committee (Nos. KM200710005015, KM200910005001).
中文摘要:

Compared with BVceo,BVces is more related to collector optimization and more practical significance,so that BVces×fT rather than BVceO×fT is employed in representing the limit of the product of the breakdown voltage-cutoff frequency in SiGe HBT for collector engineering design.Instead of a single decrease in collector doping to improve BVces×fT and BVceo×fT,a novel thin composite of N- and P~+ doping layers inside the CB SCR is presented to improve the well-known tradeoff between the breakdown voltage and cut-off frequency in SiGe HBT,and BVces and BVceo are improved respectively with slight degradation in fT.As a result,the BVces×fT product is improved from 537.57 to 556.4 GHz·V,and the BVceo×fT product is improved from309.51 to 326.35 GHz·V.

英文摘要:

Compared with BVcEo, BVcEs is more related to collector optimization and more practical significance, so that BVcEs × fT rather than BVcEo ×fT is employed in representing the limit of the product of the breakdown voltage-cutoff frequency in SiGe HBT for collector engineering design. Instead of a single decrease in collector doping to improve BVcEs × fT and BVcEo × fT, a novel thin composite of N- and P+ doping layers inside the CB SCR is presented to improve the well-known tradeoff between the breakdown voltage and cut-off frequency in SiGe HBT, and BVCES and BVCEO are improved respectively with slight degradation in fTAs a result, the BVcEs × fT product is improved from 537.57 to 556.4 GHz.V, and the BVcEo ×fT product is improved from 309.51 to 326.35 GHz.V.

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期刊信息
  • 《半导体学报:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国电子学会 中国科学院半导体研究所
  • 主编:李树深
  • 地址:北京912信箱
  • 邮编:100083
  • 邮箱:cjs@semi.ac.cn
  • 电话:010-82304277
  • 国际标准刊号:ISSN:1674-4926
  • 国内统一刊号:ISSN:11-5781/TN
  • 邮发代号:2-184
  • 获奖情况:
  • 90年获中科院优秀期刊二等奖,92年获国家科委、中共中央宣传部和国家新闻出版署...,97年国家科委、中共中央中宣传部和国家新出版署三等奖,中国期刊方阵“双效”期刊
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  • 俄罗斯文摘杂志,美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),英国英国皇家化学学会文摘,中国北大核心期刊(2000版)
  • 被引量:7754