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Magnetoelectric Bi<sub>3.25</sub>Nd<sub>0.75</sub>Ti<sub>3</sub>
期刊名称:Science and Technology
时间:2013
页码:136-140
相关项目:铁电薄膜及其存储器中界面与应变效应的研究
作者:
C.P. Cheng, Z.H. Tang,|M.H. Tang, Y.C. Zhou,|
同期刊论文项目
铁电薄膜及其存储器中界面与应变效应的研究
期刊论文 127
会议论文 1
同项目期刊论文
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Enhanced ferroelectric, dielectric and leakage properties in Ce and Ti co-doping BiFeO<sub>3&l
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