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Size effect on the ultrathin ferroelectric film directly grown on silicon for electronic devices
  • 期刊名称：RSC Advance
  • 时间：2013.10.14
  • 页码：24362-
  • 相关项目：铁电薄膜及其存储器中界面与应变效应的研究
作者： S. Yuan|J. Wang|X. Zhong|J. Huang|Y. Zhou|
同期刊论文项目
铁电薄膜及其存储器中界面与应变效应的研究
期刊论文 127 会议论文 1
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