采用磁控溅射方法在6H-SiC单晶片上制备了锑(Sb)掺杂的氧化锌(ZnO)薄膜.利用X射线衍射(XRD)和X射线光电子能谱(XPS)对样品的结晶质量和成分进行了测试.结果表明所得到的ZnO∶Sb薄膜结晶质量良好,掺Sb浓度为原子数分数1%,并且掺入的Sb原子处于Zn原子的位置.利用低温及变温光致发光谱(PL)研究了ZnO∶Sb薄膜的光学性质,观察到了与Sb有关的A0X发射,并且计算得到其受主能级为150meV.分析认为掺Sb的ZnO薄膜中受主来源于SbZn-2VZn复合缺陷.
Antimony-doped ZnO thin films was deposited on 6H-SiC substrates by RF magetron sputtering.X-ray diffraction showed that the films have high crystalline quality.X-ray photoelectron spectroscopy showed that Sb has been doped into ZnO films,and that the Sb concentration(atom percent) is about 1%.It was also verified that Sb occupies the Zn site but not the O site.Low temperature photoluminescence was carried out to investigate the optical properties of ZnO:Sb films and the A0X related to Sb dopant were observed.The corresponding acceptor energy level is about 150 meV by our calculations.Based on the analysis,SbZn-2VZn complex is the main source of acceptor of ZnO:Sb films.