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中文摘要：
根据运动学分析,研究了磁头和抛光盘接触面之间速度场的分布;结合流体力学理论,将抛光盘表面的沟槽视为楔形滑块或阶梯轴承,研究了磁头和抛光盘接触面之间抛光液的流动行为。并以织构纹形抛光盘的一种抛光工艺为例,分析了抛光液膜厚度随速度变化而发生的变化。结果表明,磁头和抛光盘的转速比大于或小于1时,接触面之间形成变化的速度场;由于速度的变化,接触面之间局部的抛光液流量也随之变化;相应地,抛光液膜的局部厚度也发生变化,这种变化达到数量级;液膜承担的载荷亦发生变化,形成局部的负压或高压,从而导致磨粒的行为发生变化,影响抛光过程。
英文摘要：
The velocity field of interface of recording heads and lappping pad was analyzed with kinematic method.The groove of the plate was regarded as wedge slider or step bearing,and the fluid action of slurry on the plate was investigated with hydrodynamics way.The thickness of the slurry film in one lapping process with a kind of texturing plate surface was calculated as an example.The results show that the variational velocity field of the interface of the recording and the plate is formed when the ratio of rot...
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