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中文摘要：
CMP（Chemical Mechanical Polishing）设备是半导体集成电路（IC）制造中的关键设备，CMP设备控制软件的开发是CMP设备研发的关键技术之一。在分析三工位CMP设备控制系统需求的基础上，对控制系统中的3个工位的模块构建等问题进行了探讨，给出了控制软件的设计方法。在对CMP系统功能架构进行详细分析的基础上，利用UML对系统控制结构进行了分析设计，并用例模型、结构模型和行为模型等对系统进行了可视化建模，然后用Rational Rose 2003的正向工程实现模型到C＋＋代码的转换，最后在此基础上用Visual C＋＋进行系统开发和实现。
英文摘要：
CMP （Chemical Mechanical Polishing）equipment is key to the semiconductor integrated circuit （IC） manufacturing, and the development of its control software is one of the key technologies of CMP equipment design. Based on the analysis of the control requirements of three-station equipment, the module structures etc of the CMP control system are discussed, and then the design approach of the control software is proposed. Based on the detailed analysis of function structure of CMP control system, the structure of the CMP control system is analyzed and designed in UML, then visual modeling of control system is realized on the basis of case model, structure model and behavior model. The translation from model to C＋＋ code is realized by Forward Engineering of Rational Rose 2003, and finally the control system is developed and realized in Visual C＋＋.
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