位置：成果数据库 > 期刊 > 期刊详情页
The influence of substrate temperature on the hydrogenated microcrystalline silicon growth through h
  • ISSN号：1369-8001
  • 期刊名称：Materials Science in Semiconductor Processing
  • 时间：2014.12.4
  • 页码：1-7
  • 相关项目：磁场辅助等离子体增强原子层沉积技术中的物理问题研究
作者： Jiuxiang Chen|Shouye Zhang|Jilong Shi|Qiang Chen|
同期刊论文项目
磁场辅助等离子体增强原子层沉积技术中的物理问题研究
期刊论文 45 会议论文 24
同项目期刊论文
Influence of Magnetic Field on the Reaction Mechanisms ofPlasma-Assisted Atomic Layer Deposition of
The Role of Atomic Layer Deposited Aluminum Oxide on SnO2 BasedDye-Sensitized Solar Cells Performanc
Low-Temperature Atomic Layer Deposition of High Purity, Smooth, LowResistivity Copper Films by Using
Performance improvement of inverted organic solar cells by adding ultrathin Al2O3 as an electron sel
Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer dep
等离子体辅助原子层沉积氧化铝薄膜的研究
ElectronCyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3Thin Films
Characteristicsand properties of metal aluminum thin ？lms prepared by electron cyclotronresonance pl
The Resolution of Mode Transition in Helicon Discharge Through ICCD
Plasma-AssistedALD of Al2O3 Permeation Barrier Layer on Plastics
电子回旋共振辅助原子层沉积金属铝薄膜的研究
染料敏化太阳能电池二氧化锡光阳极表面原子层沉积氧化铝研究
Nanocrystalline Si:H films made by inductively coupled plasma using internal low inductance antenna
短管螺旋波放电中等离子体参数测量和模式转化研究
螺旋波等离子体的发射光谱研究
Numerical Simulation of the Sustaining Discharge in Radio Frequency Hollow Cathode Discharge in Argo
化学气相沉积/原子层沉积铜前驱体的研究进展
Dye adsorption on atomic layerdeposited aluminum oxides for tin-oxide-based dye sensitized solar ce
Insights of Unconventionally Long Exposure Time in Atomic Layer Deposition Al2O3 to Modify SnO2 Phot
螺旋波等离子体放电特性的射频补偿朗缪尔单探针测量研究
The Evolution of Discharge Mode Transition in HeliconPlasma through ICCD Images
The Two Density Peaks in Low Magnetic FieldHelicon Plasma
孔深对射频空心阴极放电特性的影响
低温ALD沉积Al掺杂TiO_2薄膜性能的研究及在钙钛矿太阳电池上的应用
电子回旋共振等离子体辅助原子层沉积金属铝薄膜的研究
包装材料及食品中纳米材料的检测与表征技术
MPECVD中氧化硅阻隔层性能的研究
Modulation of absorption manner in helicon discharges by changing profile of low axial magnetic field
大气压氦气/氮气和氩气/氮气射频介质阻挡放电六边形斑图特性比较
Kinetic Migration of Diethylhexyl Phthalate in Functional PVC Films
Reversal of radial glow distribution in helicon plasma induced by reversed magnetic field
Surface engineering of synthetic nanopores by atomic layer deposition and their applications
Investigation of Microwave Surface-Wave Plasma Deposited SiOx Coatings on Polymeric Substrates
衬底材料对空心阴极沉积氢化微晶硅薄膜的影响
High Growth Rate of Microcrystalline Silicon Films Prepared by ICP-CVD with Internal Low Inductance Antennas
Characterization of W Coating on Cu Substrate Prepared by Double-Glow Discharge
Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
Characteristics and properties of metal aluminum thin films prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology
Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
Plasma Modified Polypropylene Membranes as the Lithium-Ion Battery Separators
Atmospheric Pressure Radio Frequency Dielectric Barrier Discharges in Nitrogen/Argon
Restraint Effect of Filaments on Applied Voltage in Atmospheric Pressure Glow Discharge
Properties of Plasma Enhanced Chemical Vapor Deposition Barrier Coatings and Encapsulated Polymer Solar Cells