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Investigation of Microwave Surface-Wave Plasma Deposited SiOx Coatings on Polymeric Substrates
  • ISSN号:1009-0630
  • 期刊名称:《等离子体科学与技术:英文版》
  • 时间:0
  • 分类:TQ634.495[化学工程—精细化工] O484.1[理学—固体物理;理学—物理]
  • 作者机构:[1]Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication,Beijing 102600, China
  • 相关基金:supported financially by National Natural Science Foundation of China (Nos. 11175024, 11375031), Beijing Natural Science Foun- dation (No. 1112012), and the National Science & Technology Pillar Program for the 12th Five-year Plan, 2011BAD24B01; Bei- jing Education Committee Foundation of Science and Technology (Nos. KM2011100015008, KM201010015005), BIGC Key Project (No. 23190113051) and PHR20110516, PHR201107145, Fujian Provincial Department of Science and Technology Key Project of China (No. 2012H0008)
中文摘要:

In this paper, we reported nano-scale SiOx coatings deposited on polyethylene terephthalate(PET) webs by microwave surface-wave assisted plasma enhanced chemical vapor deposition for the purpose of improving their barrier properties. Oxygen(O2) and hexamethyldisiloxane(HMDSO) were employed as oxidant gas and Si monomer during SiOx deposition, respectively. Analysis by Fourier transform infrared spectroscope(FTIR) for chemical structure and observation by atomic force microscopy(AFM) for surface morphology of SiOx coatings demonstrated that both chemical compounds and surface feature of coatings have a remarkable influence on the coating barrier properties. It is noted that the processing parameters play a critical role in the barrier properties of coatings. After optimization of the SiOx coatings deposition conditions, i.e. the discharge power of 1500 W, 2 : 1 of O2 : HMDSO ratio and working pressure of 20 Pa, a better barrier property was achieved in this work.

英文摘要:

In this paper, we reported nano-scale SiOx coatings deposited on polyethylene terephthalate (PET) webs by microwave surface-wave assisted plasma enhanced chemical vapor deposition for the purpose of improving their barrier properties. Oxygen (O2) and hexamethyl- disiloxane (HMDSO) were employed as oxidant gas and Si monomer during SiOx deposition, re- spectively. Analysis by Fourier transform infrared spectroscope (FTIR) for chemical structure and observation by atomic force microscopy (AFM) for surface morphology of SiO~ coatings demon- strated that both chemical compounds and surface feature of coatings have a remarkable influence on the coating barrier properties. It is noted that the processing parameters play a critical role in the barrier properties of coatings. After optimization of the SiOx coatings deposition conditions, i.e. the discharge power of 1500 W, 2 : 1 of O2 : HMDSO ratio and working pressure of 20 Pa, a better barrier property was achieved in this work.

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期刊信息
  • 《等离子体科学与技术:英文版》
  • 主管单位:中国科学院 中国科协
  • 主办单位:中国科学院等离子体物理研究所 中国力学学会
  • 主编:万元熙、谢纪康
  • 地址:合肥市1126信箱
  • 邮编:230031
  • 邮箱:pst@ipp.ac.cn
  • 电话:0551-5591617 5591388
  • 国际标准刊号:ISSN:1009-0630
  • 国内统一刊号:ISSN:34-1187/TL
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,美国科学引文索引(扩展库),英国科学文摘数据库
  • 被引量:89