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Low-Temperature Atomic Layer Deposition of High Purity, Smooth, LowResistivity Copper Films by Using
  • ISSN号：0897-4756
  • 期刊名称：Chemistry of Materials
  • 时间：2015
  • 页码：5988-5996
  • 相关项目：磁场辅助等离子体增强原子层沉积技术中的物理问题研究
作者： Zheng Guo, Hao Li, Qiang Chen, Lijun Sang,Lizhen Yang|Zhongwei Liu, and Xinwei Wang|
同期刊论文项目
磁场辅助等离子体增强原子层沉积技术中的物理问题研究
期刊论文 45 会议论文 24
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