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Nanocrystalline Si:H films made by inductively coupled plasma using internal low inductance antenna
  • ISSN号：1369-8001
  • 期刊名称：Materials Science in Semiconductor Processing
  • 时间：2014.11.27
  • 页码：1-7
  • 相关项目：磁场辅助等离子体增强原子层沉积技术中的物理问题研究
作者： W.C. Wang|X.X. Jiang|J.S. Cherng|Q. Chen|
同期刊论文项目
磁场辅助等离子体增强原子层沉积技术中的物理问题研究
期刊论文 45 会议论文 24
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